Self-Assembly/Patterning/Lithography
Self-Assembly/Patterning/Lithography
Authors: Thomas Soike, Amanda K. Streff, Chenxia Guan, Ryan Ortega, Mohammed Tantawy, Christopher Pino, V. Prasad Shastri
Posted On: February 10, 2010 Posted By: admin
Journal: Advanced Materials
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
45
Authors: Luc Scheres, Jurjen ter Maat, Marcel Giesbers, Han Zuilhof
Posted On: February 9, 2010 Posted By: admin
Journal: Small
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
61
Authors: Kyungsu Na, Minkee Choi, Woojin Park, Yasuhiro Sakamoto, Osamu Terasaki and Ryong Ryoo
Posted On: February 5, 2010 Posted By: admin
Journal: Journal of American Chemical Society
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
50
Authors: Andrew J. Pollard, Edward W. Perkins, Nicholas A. Smith, Alex Saywell, Gudrun Goretzki, Anna G. Phillips, Stephen P. Argent, Hermann Sachdev, Frank Müller, Stefan Hüfner, Stefan Gsell, Martin Fischer, Matthias Schreck, Jürg Osterwalder, Thomas Greber, Simon Berner, Neil R. Champness, Peter H. Beton
Posted On: February 5, 2010 Posted By: admin
Journal: Angewandte Chemie International Edition
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
55
Authors: Artur Ciesielski, Stefano Lena, Stefano Masiero, Gian Piero Spada, Paolo Samorì
Posted On: February 5, 2010 Posted By: admin
Journal: Angewandte Chemie International Edition
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
51
Authors: Mei He and Amy E. Herr
Posted On: February 4, 2010 Posted By: admin
Journal: Journal of American Chemical Society
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
58
Authors: Amit Finkler, Yehonathan Segev, Yuri Myasoedov, Michael L. Rappaport, Lior Ne’eman, Denis Vasyukov, Eli Zeldov, Martin E. Huber, Jens Martin and Amir Yacoby
Posted On: February 4, 2010 Posted By: admin
Journal: Nano Letters
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
48
Authors: Soojin Park, Dong Hyun Lee, Thomas P. Russell
Posted On: February 4, 2010 Posted By: admin
Journal: Advanced Materials
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
52
Authors: Hirotaka Okamoto, Yoko Kumai, Yusuke Sugiyama, Takuya Mitsuoka, Koji Nakanishi, Toshiaki Ohta, Hiroshi Nozaki, Satoshi Yamaguchi, Soichi Shirai and Hideyuki Nakano
Posted On: February 3, 2010 Posted By: admin
Journal: Journal of American Chemical Society
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
58
Authors: Tatsuya Homma, Koji Harano, Hiroyuki Isobe, Eiichi Nakamura
Posted On: February 2, 2010 Posted By: admin
Journal: Angewandte Chemie International Edition
Research Areas:
Self-Assembly/Patterning/Lithography,
Rating: 0.0 /5 (0 votes cast)
50
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